Features of formation of amorphous phase on the surface of the functiomal alloy Ti2NiCu under selective etching by gallium ions

 

V. S. Afonina¹, A. V. Irzhak^2,3, V. V. Koledov¹, V. G. Shavrov¹, V. A. Dikan², V. A. Podgorny²

¹Kotelnikov Institute of Radio Engineering and Electronics of RAS

²National Research Technological University "MISiS"

³Institute of Microelectronics Technology and High Purity Materials of RAS

 

The paper is received on December 1, 2015

 

Abstract. The process of formation of  an amorphous phase on the surface of the functional alloy Ti2NiCu with shape memory effect (SME) is studied experimentally, under action of gallium ion beam in the device for selective ion etching (FIB). The influence of a focused beam of gallium ions up on the properties of the surface of the alloy in the different conditions and geometry is investigated. By the method of TEM it is shown that the ion beam produces the amorphous layer on the surface of crystalline alloy with a sharp boundary. It is noted that the amorphous layer can both adversely affect the quality of samples of submicron Ti₂NiCu alloy, which are used as active materials in microsystems technology, and expand the functionality of nanostructures on its basis.

Keywords: shape memory effect, the method of selective ion etching, microsystem technology, the amorphous phase of the alloy, Ti2NiCu.