Features of formation of amorphous phase on the surface of the functiomal
etching by gallium ions
Afonina1, A. V. Irzhak2,3, V. V. Koledov1,
V. G. Shavrov1, V. A. Dikan2, V. A. Podgorny2
Institute of Radio Engineering and Electronics of RAS
Research Technological University "MISiS"
of Microelectronics Technology and High Purity Materials of RAS
The paper is received on December 1, 2015
The process of formation of an amorphous phase on the surface of the
functional alloy Ti2NiCu with shape memory effect (SME) is studied
experimentally, under action of gallium ion beam in the device for selective
ion etching (FIB). The influence of a focused beam of gallium ions up on the
properties of the surface of the alloy in the different conditions and geometry
is investigated. By the method of TEM it is shown that the ion beam produces the
amorphous layer on the surface of crystalline alloy with a sharp boundary. It
is noted that the amorphous layer can both adversely affect the quality of
samples of submicron Ti2NiCu alloy, which are used as active
materials in microsystems technology, and expand the functionality of
nanostructures on its basis.
shape memory effect, the method of selective ion etching, microsystem
technology, the amorphous phase of the alloy, Ti2NiCu.