The investigation
of the microstructure of titanium thin films
for cryogenic detectors with various modes of magnetron sputtering
Igor G. Lyahov 1,
Konstantin V. Bulah 1,
Aleksey S. Il’in 2
1
Moscow Institute of Physics and Technology (State University)
2Kotel'nikov
Institute of Radio Engineering and Electronics of RAS
Received
September 12, 2012
Abstract. A study of
titanium thin films received by different modes of magnetron sputtering on a
silicon substrate with the help of electrical measurements at T=300 K and 77 K
and research on atomic-force microscope (AFM) and x-ray diffractometry (XRD)
were made. The dependence of the residual resistivity of the films (and the
critical temperature of superconducting transition TC) on sputtering
parameters was shown. The data was compared with measurements
on the AFM and XRD.
Keywords:
superconducting bolometers, transition edge sensors, superconducting titanium
thin films, express method for estimating the critical temperature, X-ray
diffractometry.