"JOURNAL OF RADIO ELECTRONICS"  N 9, 2012

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The investigation of the microstructure of titanium thin films for cryogenic detectors with various modes of magnetron sputtering


Igor G. Lyahov 1, Konstantin V. Bulah 1, Aleksey S. Il’in 2

1 Moscow Institute of Physics and Technology (State University)
2Kotel'nikov Institute of Radio Engineering and Electronics of RAS
  

Received September
12, 2012

Abstract. A study of titanium thin films received by different modes of magnetron sputtering on a silicon substrate with the help of electrical measurements at T=300 K and 77 K and  research on atomic-force microscope (AFM) and x-ray diffractometry (XRD) were made. The dependence of the residual resistivity of the films (and the critical temperature of superconducting transition TC) on sputtering parameters was shown. The data was compared with measurements on the AFM and XRD.

Keywords: superconducting bolometers, transition edge sensors, superconducting titanium thin films, express method for estimating the critical temperature, X-ray diffractometry.