Use of poly(ether sulfone) (PES) for electron-beam lithography

 

A. S. Ilin, A. A. Kuzmin, A. G. Kovalenko

 Kotel’nikov Institute of Radio Engineering and Electronics of RAS

 

Received August 10, 2011

 

Abstract: The possibility of a new technological process of manufacturing of microstructures by electron-beam lithography with negative resist based on an industrial polymer poly(ether sulfone) (PES) is investigated. PES is thermostable and relatively inert polymer, which makes it suitable for magnetron sputtering of refractory metals, such as titanium, molybdenum or niobium without fear of contamination of samples by degassing of resist at high temperatures. This property of the material can be successfully used in the field of superconducting microelectronics, where the purity of a superconductor is one of the priorities of processes.

Keywords: electron-beam lithography, poly(ether sulfone), PES, thermostable resist, technology of micron, submicron and nanometer-scale superconducting structures.