poly(ether sulfone) (PES) for electron-beam lithography
A. S. Ilin, A. A. Kuzmin, A. G. Kovalenko
Kotelínikov Institute of Radio Engineering and Electronics
August 10, 2011
Abstract: The possibility of a new technological process of manufacturing
of microstructures by electron-beam lithography with negative resist based on an
industrial polymer poly(ether sulfone) (PES) is investigated. PES is thermostable
and relatively inert polymer, which makes it suitable for magnetron sputtering of
refractory metals, such as titanium, molybdenum or niobium without fear of contamination
of samples by degassing of resist at high temperatures. This property of the material
can be successfully used in the field of superconducting microelectronics, where
the purity of a superconductor is one of the priorities of processes.
Keywords: electron-beam lithography, poly(ether sulfone), PES, thermostable resist,
technology of micron, submicron and nanometer-scale superconducting structures.