Journal of Radio Electronics. eISSN 1684-1719. 2024. ¹11

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DOI: https://doi.org/10.30898/1684-1719.2024.11.7

 

 

 

Production OF THIN-FILM COATINGS
OF VANADIUM OXIDES BY CHEMICAL VAPOR DEPOSITION
FROM VANADYL ISOPROPOXIDE

 

D.P. Sudas, V.A. Jitov, L.Yu. Zakharov, V.A. Luzanov, P.I. Kuznetsov

 

Kotelnikov IRE RAS Frayzino branch

141190, Russia, Moscow reg., Frayzino, Vvedenskiy str., 1

 

The paper was received July 12, 2024.

 

Abstract. A technique for obtaining vanadium oxides of various stoichiometries from vanadyl isopropoxide by chemical vapor deposition is demonstrated. Various vanadium oxides from the Magnelli series have been obtained. Thin-film coatings are applied to the surface of silicon and sapphire. Coatings deposited in an argon flow at temperatures from 220 ˚C to 290 ˚C were evaluated by transmission spectra, Raman scattering and X-ray diffraction. Four oxides (V3O5, VO2, V6O13, V2O5) with different ratios were found in the synthesized amorphous structures. In a number of coatings on silicon substrates, a phase transition of the second kind with a jump in electrical resistance up to 10 times at a temperature of 69 ˚C, was recorded.

Key words: vanadium oxide, phase transition, optical fiber, thin films.

Financing: This research was funded according to the State Task of the Fryazino branch Kotelnikov Institute of Radio Engineering and Electronics RAS (No. 075-01110-23-01).

Corresponding author: Sudas Dmitriy Petrovich, dmitriisudas@mail.ru

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For citation:

Sudas D.P., Jitov V.A., Zakharov L. Yu., Luzanov V. A., Kuznetsov P.I.  Production of thin-film coatings of vanadium oxides by chemical vapor deposition from vanadyl isopropoxide. // Journal of Radio Electronics. – 2024. – ¹. 11. https://doi.org/10.30898/1684-1719.2024.11.7 (In Russian)